Articles
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Volume 4 (2003)
- Vol. 4 No. 1 1-48
- Vol. 4 No. 2 49-103
- Vol. 4 No. 3 105-154
- Vol. 4 No. 4 155-216
Volume 4, Number 4, 155-216, December 2003 [Articles]
- Eugene Garfield* and A. I. Pudovkina
- 2003; 4(4): 155-167
- Sangyoul Lee, Kwangjoon Hong*, Bongju Lee, Hyuk Junga and Youngtae Yoob
- 2003; 4(4): 168-172
- Cathodoluminescence Characteristics of Nitrogen-Incorporated Diamond Films Grown by Microwave Plasma CVD
- S.H. Seo*, T.H. Leea, J.S. Parka and K.H. Auhb
- 2003; 4(4): 173-176
- Takanori Watari*, Hiroshi Tsubira, Toshio Torikai, Mitsunori Yada and Sachiko Furutaa
- 2003; 4(4): 177-180
- Eunsang Na, Sung-Churl Choi and Ungyu Paik*
- 2003; 4(4): 181-184
- Advanced high density plasma processing in inductively conupled plasama systems for plasma enhanced chemical vapor deposition and dry etching of electronic material
- Jewon Lee*, Wantae Lim, Inkyoo Baek and Guan Sik Cho
- 2003; 4(4): 185-190
- Solid State Synthesis Processing and Electrical Properties of Sr(TixZr1-x)O3 (0=x=1) Ceramics for high Voltage Applications
- Rajesh V. Shende, Daniel S. Kruegera and Stephen J. Lombardo*
- 2003; 4(4): 191-196
- Yosuke Tanaka, Yoshihiro Hirata* and Ryuichi Yoshinaka
- 2003; 4(4): 197-201
- Ik-Jin Kima,* and Kee Sung Leeb
- 2003; 4(4): 202-209
- Takanori Shinoura, Masato Ueharaa, Naoya Enomotoa and Junichi Hojo*
- 2003; 4(4): 210-213
- Preparation and Hydro Thermal Corrosion Resistance of Silicon Nitride with Lu-Si-O EBC Layer at High Temperature
- Shunkichi Ueno*, D. Doni Jayaseelan, Tatsuki Ohji, Naoki Kondo and Shuzo Kanzaki
- 2003; 4(4): 214-216
Copyright 2019 International Orgranization for Ceramic Processing. All rights reserved.Clean-Energy Research Institute(CRI), Hanyang University, 222, Wangsimni-ro, Seongdong-gu, Seoul, 04763, Korea
E-mail: jcpr@hanyang.ac.kr