Articles
  • Effect of pyrolysis temperature on ZnO films prepared by chemical solution deposition 
  • Kyu-Seog Hwang, Ju-Hyun Jeong, Kyung-Ok Jeona, Young-Sun Jeona and Byung-Hoon Kima,*
  • Department of Applied Optics and Institute of Photoelectronic Technology, Nambu University, 864-1 Wolgye-dong, Gwangsangu, Gwangju 506-824, Korea a Department of Materials Science & Engineering, Chonnam National University, 300 Yongbong-dong, Buk-gu, Gwangju 500-757, Korea
Abstract
ZnO thin films were prepared on soda-lime-silica glass substrates by a chemical solution deposition process using zinc naphthenate. To investigate the effect of pyrolysis temperature, the precursor films were pyrolyzed at 200 degrees C for 60 minutes or at 500 degrees C for 10 minutes, followed by a final heat treatment at 600 degrees C. Films highly transparent in the visible range were obtained. The relation between residual organic components and the properties of the films are discussed.

Keywords: ZnO thin film; chemical solution deposition; residual organic components

This Article

  • 2006; 7(3): 221-223

    Published on Sep 30, 2006