Articles
  • Nickel-doped titanium oxide films prepared by chemical solution deposition
  • Yong-Mu Lim, Ju-Hyun Jeonga,b, Jun-Hyung Ana,b, Young-Sun Jeona,b, Kyung-Ok Jeona,b, Kyu-Seog Hwanga and Byung-Hoon Kima,*
  • Department of Ophthalmic Optics, Gwangju Health College, 683-3 Sinchang-dong, Gwangsan-gu, Gwangju 506-701, Korea a Interdisciplinary Program of Biomedical Engineering and Department of Materials Science & Engineering, Chonnam National University, 300 Yongbong-dong, Buk-gu, Gwangju 500-757, Korea b Department of Applied Optics and Institute of Photoelectronic Technology, Nambu University, 864-1 Wolgye-dong, Gwangsangu, Gwangju 506-824, Korea
Abstract
15 mol% nickel-doped titanium oxide thin films were prepared from metal naphthenate precursors. Films prefired at 500 degrees C for 10 minutes were annealed at 600 degrees C for 30 minutes in air. The crystallinities of the annealed films were investigated by a high resolution X-ray diffraction system. A surface morphological study was made to characterize the surface structure of the films. A sharp absorption edge of the films was observed. The films containing nickel showed a shift towards the visible in the absorption threshold.

Keywords: Nickel, TiO2 film, crystallinity, absorption edge

This Article

  • 2005; 6(4): 302-304

    Published on Dec 30, 2005