Indium tin oxide (ITO) thin films were synthesized on glass substrates by chemical solution deposition from starting materials of Indium (III) acetylacetonate and Tin (IV) iso-propoxide. The ITO films were fired in a temperature range of 400 oC to 600 oC and annealed under N2 gas at 500 oC. The effects of surface chemical treatment on the sheet resistance of ITO films were investigated with AFM surface morphology and sheet resistance. The spin-coated ITO thin films, which was etched with KOH solution for 20 seconds, exhibited a sheet resistance value of approximately 352 Ω/square. The AFM surface morphologies of ITO thin films revealed a difference of surface roughness and morphology between the as-received films and the etched films. Also, ITO thin films showed an optical transmittance of about 90% in the range of 800 nm.

Keywords: Indium tin oxide (ITO) thin films, Chemical solution deposition, Sheet resistance, Surface treatment