Articles
  • Electrochemical properties of nickel hydroxide films deposited galvanostatically
  • S.-J. Kima, M.-K. Hongb, B.C. Kimc, J.-K. Chungb, G.G. Wallaced and S.-Y. Parka,b,*
  • a Department of Ceramic Engineering, Gangneung-Wonju National University Gangneung, 210-702, Korea b Technology Innovation Center for Fine Ceramic, Gangneung-Wonju National University, Gangneung, 210-702, Korea c Natural Science Research Institute, Department of Chemistry, Dongguk University, Seoul, 100-715, Korea d ARC Centre of Excellence for Electromaterials Science, Intelligent Polymer Research Institute, AIIM Facility, Innovation Campus, University of Wollongong, Wollongong, NSW 2522, Australia
Abstract
A high specific capacitance was obtained for Ni(OH)2 galvanostatically deposited onto a stainless-steel foil. The structure and surface morphology of the Ni(OH)2 were studied using X-ray diffraction(XRD) analysis and scanning electron microscopy(SEM). A loosely packed structure containing individual Ni(OH)2 particles with an average size of 10-20 nm was obtained. The thickness of the deposit was several micro met. The capacitive characteristics of the Ni(OH)2 electrodes were investigated using cyclic voltammetry(CV) in a 1 M KOH electrolyte solution. A maximum specific capacitance of 1233 F g-1 was obtained for the Ni(OH)2 electrode with a voltage range 0-0.5 V. The effect of deposition conditions, such as the current density, and 0.1M aqueous solution of Ni(NO3)2 • 6H2O on the electrochemical capacitance of the deposited Ni(OH)2 films are discussed in detail.

Keywords: Nickel hydroxide films, Galvanostatic deposition, Redox capacitior, Electrochemical properties.

This Article

  • 2012; 13(6): 688-692

    Published on Dec 31, 2012