Transparent conducting oxide (TCO), indium-tin oxide (ITO) thin films were deposited on a polymer substrate by a RF magnetron sputtering method using a moving gun. A moving gun was used to minimize thermal damage to the substrate and underlying structure. The conditions used for depositing the ITO films were varied. A working pressure in the range of 0.67 to 2.67 Pa and an oxygen flow rate in the range of 0 to 0.3 SCCM were used. The roughness, mobility, electrical resistivity and optical transparency of the ITO films deposited on the polymer substrates were evaluated. The electrical resistivity of ITO films deposited on polyethylene terephthalate substrates at room temperature had a relatively low electrical resistivity, 9.014 × 104 Ω·cm. ITO films had a higher electrical resistivity when prepared using a, higher oxygen flow rate and working pressure. The optical transmission of the ITO films was above 85% in the wavelength range 450 to 750 nm. The band gap of the ITO films decreased with an increase in both working pressure and oxygen pressure.

Keywords: ITO, RF magnetron sputtering, optical transparency, transparent conducting oxide