Articles
  • Microstructural evolution of chemically vapor-deposited tantalum carbide at elevated temperature

  • Jangwon Hana,b, SangMin Jeongc, Ji Yeon Parkb, Hyun-Geun Leeb, Weon-Ju Kimb, Chan Parka and Daejong Kimb,*

  • aSchool of Materials Science & Engineering, Seoul National University, Seoul 08826, Republic of Korea
    bNuclear Materials Development Division, Korea Atomic Energy Research Institute, Daejeon 34057, Republic of Korea
    cSiC Division, HANA Materials, Asan 31413, Republic of Korea

  • This article is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/4.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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This Article

  • 2022; 23(6): 751-757

    Published on Dec 31, 2022

  • 10.36410/jcpr.2022.23.6.751
  • Received on Dec 4, 2019
  • Revised on Mar 23, 2020
  • Accepted on Mar 24, 2020

Correspondence to

  • Daejong Kim

  • Nuclear Materials Development Division, Korea Atomic Energy Research Institute, Daejeon 34057, Republic of Korea
    Tel : +82-42-868-4559 Fax: +82-42-868-8549

  • E-mail: dkim@kaeri.re.kr