Articles
  • Structural, physical and electrical properties of SiO2 thin films formed by atmospheric-pressure plasma technology

  • Kyoung-Bo Kima and Moojin Kimb,*

  • aDepartment of Materials Science & Engineering, Inha Technical College, Incheon 22212, Republic of Korea
    bDepartment of Electronic Engineering, Kangnam University, Yongin 16979, Republic of Korea

  • This article is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/4.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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This Article

  • 2022; 23(4): 535-540

    Published on Aug 31, 2022

  • 10.36410/jcpr.2022.23.4.535
  • Received on Jul 15, 2021
  • Revised on Mar 24, 2022
  • Accepted on Apr 2, 2022

Correspondence to

  • Moojin Kim

  • Department of Electronic Engineering, Kangnam University, Yongin 16979, Republic of Korea
    Tel : +82-31-280-3809 Fax: +82-31-281-3604

  • E-mail: moojinkim7@kangnam.ac.kr