Articles
  • Structural and electrical properties of potassium tantalate niobate heterolayer thin films prepared by chemical solution deposition method
  • Byeong-Jun Parka,†, Sam-Haeng Leea,b,†, Myung-Gyu Leea,b, Joo-Seok Parkb, Byung-Cheul Kimc and Sung-Gap Leea,*

  • aDept. of Materials Engineering and Convergence Technology, RIGET, Gyeongsang National University, Jinju 52828, Korea
    bBusiness Support Division, Korea Institute of Ceramic Engineering and Technology, Jinju 52851, Korea
    cDept. of Convergence Electronic Engineering, Gyeongsang National University, Jinju 52828, Korea

  • This article is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/4.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

References
  • 1. J.H. Yoo, S.J. Cho, Trans. Electr. Electron. Mater. 20 (2019) 36-39.
  •  
  • 2. S.P. Alpay, J. Mantese, S. Trolier-McKinstry, Q. Zhang, R.W. Whatmore, MRS Bull. 39 (2014) 1099-1111.
  •  
  • 3. A.S. Mischenko, Q. Zhang, J.F. Scott, R.W. Whatmore, and N.D. Mathur, Science 311 (2006) 1270-1271.
  •  
  • 4. X. Yan, M. Zhu, Q. Wei, S.-G. Lu, M. Zheng and Y. Hou, Scripta Materialia 162 (2019) 256-260.
  •  
  • 5. M. Kwon, S. Lee, K. Kim, S. Choi, J. Ceram. Process. Res. 20 (2019) 395-400.
  •  
  • 6. S. Guillemet-Fritsch, C. Chanel, J. Sarrias, S. Bayonne, A. Rousset, X. Alcobe, and M.L. Martinez Sarrion, Solid State Ionics 128 (2000) 233-242.
  •  
  • 7. B. Liu, H. Zhang, Y. Zhang, X. Lv, Y. Yang, L. Wei, X. Wang, H. Yu, C. Zhang, and J. Li, Acta. Phys. Pol. A. 135 (2019) 396-400.
  •  
  • 8. S.R. Sashital, S. Krishnakumar, S. Esener, Appl. Phys. Lett. 62 (1993) 2917-2919.
  •  
  • 9. S. Wang, L. Wang, T. Zhou, T. Zhang, X. Xiong, A. Kugna, Ferroelectrics 186 (1996) 193-198.
  •  
  • 10. A. Le Febvrier, S. Deputier, V. Bouquet, V. Demange, S. Ollivierr, A.C. Galca, C. Dragoi, R. Radu, L. Pintilie, M. Guilloux-Viry, Thin Solid Films 520 (2012) 4564-4567.
  •  
  • 11. K.M. Kim, S.G. Lee, and M.S. Kwon, J. Ceram. Process. Res. 19 (2018) 302-305.
  •  
  • 12. J. Mantese, A. Micheli, N. Schubring, A. Catalan, Y. Chen, R. Waldo, C. Wong, J. Appl. Phys. 72 (1992) 615-619.
  •  
  • 13. C.C. Wang, M. He, F. Yang, J. Wen, G.Z. Liu, H.B. Lu, Appl. Phys. Lett. 90 (2007) 192904.
  •  
  • 14. G.L. Brennecka, W. Huebner, B.A. Tuttle, P.G. Clem, J. Am. Ceram. Soc. 87 (2004) 1459-1465
  •  
  • 15. M. Park, S. Lee, K. Kim and M. Kwon, J. Ceram. Process. Res. 18 (2017) 431-434
  •  
  • 16. W. Geng, Y. Liu, X. Meng, L. Bellaiche, J. F. Scott, B. Dkhil, A. Jiang, Adv. Mater. 27 (2015) 3165-3169.
  •  
  • 17. H. Maiwa, Jpn. J. Appl. Phys. 54 (2015) 10NB08.
  •  
  • 18. S. Kar-Narayan, N. D. Mathur, J. Phys. D 43 (2010) 032002.
  •  

This Article

  • 2022; 23(3): 252-256

    Published on Jun 30, 2022

  • 10.36410/jcpr.2022.23.3.252
  • Received on Jul 22, 2021
  • Revised on Jan 18, 2022
  • Accepted on Jan 25, 2022

Correspondence to

  • Sung-Gap Lee
  • Dept. of Materials Engineering and Convergence Technology, RIGET, Gyeongsang National University, Jinju 52828, Korea
    Tel : +82-10-2686-4427 Fax: +82-55-772-1689

  • E-mail: lsgap@gnu.ac.kr