Articles
  • TiO2-xNx thin films synthesized by liquid spray mist chemical vapor deposition (LSMCVD) and their photoelectrical properties
  • Woo-Jin Leea, Ji-Won Moonb,*, Su-Jin Hongc, Sang-Hee Kimc, Bok-Hee Kimc and Akihiro Wakaharad
  • a R&D Plasma Process Development 1 Group, ASM Japan K. K. 23-1, 6-chome Nagayama, Tama-shi, Tokyo 206-0025, Japan b Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152- 8552, Japan c Division of Electronic Materials Engineering, Chonbuk National Univerisy, 664-14 Duckjin-dong, Duckjin-ku, Chonju 561- 756, Korea d Department of Electrical and Electronic Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku, Toyohashi, Aichi 441-8580, Japan
Abstract
TiOx-2Nx electrodes were prepared by liquid sprayed mist chemical vapor deposition (LSMCVD) at 1 atmospheric pressure. The liquid source was made by dissolving the starting materials in 2-methoxyethanol. Through controlling the substrate temperature and deposition time, TiO2-xNx films could successfully be fabricated. The photoelectrochemical response in an electrolyte for nitrogen-doped titanium dioxide, TiOx-2Nx, was examined. From the optical absorption spectra of TiO2-xNx and TiO2 films, the TiO2-xNx films noticeably absorb the light at less than 550 nm. With light irradiation, the photoelectrochemical response shows significant improvement for the nitrogen-doped film electrode, compared to the situation for undoped TiO2.

Keywords: Titanium dioxide, Nitrogen doping, Liquid mist spray CVD, Photocatalyst.

This Article

  • 2008; 9(1): 38-41

    Published on Feb 28, 2008

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