Pablo C. Carbo-Velab,*, José M. Almanza-Roblesa, Dora A. Cortés-Hernándeza, José C. Escobedo-Bocardoa, José A. Rodríguez-Garcíab and Wilian J. Pech-Rodríguezb
aCentro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional Unidad Saltillo, Ave. Industria Metalúrgica No. 1062, Parque Industrial Saltillo-Ramos Arizpe, C.P. 25900, Ramos Arizpe, Coahuila, México
bUniversidad Politécnica de Victoria, Av. Nuevas Tecnologías No. 5902, Parque Científico y Tecnológico de Tamaulipas, C.P. 87138, Cd. Victoria, Tamaulipas, México
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Titanite (CaTiSiO5) was prepared from a mixture of CaCO3, TiO2 and SiO2 with and without high-energy mechanical activation. Niobium-doped titanite samples were prepared without mechanical activation from a mixture of CaCO3, TiO2, SiO2 and Nb2O5 according to CaTi1-xNbxSiO5, where x = 0.0, 0.05, 0.1 and 0.15. All samples were heat treated at 1250°C for 4 h. Then, samples were characterized by X-ray diffraction (XRD) and UV-vis spectroscopy and selected samples were evaluated by cyclic voltammetry. Titanite was obtained as a single phase in samples with mechanical activation while the no activated sample showed the presence of second phases. The band gap values are within the range of semiconductor materials (3.34 and 3.47 eV). The current densities under off and on conditions were 1.06 and 1.65 mAcm-2, respectively. These values are related to the oxygen evolution reaction. The more appropriated results were obtained for the titanite obtained with mechanical activation. On the other hand, according to X-ray diffraction results, the maximum amount of Nb-doped titanite obtained after heat treatment was 95.1 wt.%. The band gap was reduced, from 3.48 to 3.36 eV, as Nb concentration was increased. Nonetheless, all titanite-based compounds are semiconductor materials suitable to be used as photocatalytic materials.
Keywords: High-energy ball milling, Photo-electrochemical properties, Calcium titanium silicate, Doping process, Powders.
2025; 26(1): 23-29
Published on Feb 28, 2025
Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional Unidad Saltillo, Ave. Industria Metalúrgica No. 1062, Parque Industrial Saltillo-Ramos Arizpe, C.P. 25900, Ramos Arizpe, Coahuila, México
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