Kyeong-Min Kima,#, Sam-Haeng Leea,b,#, Byeong-Jun Parka, Joo-Seok Parkb and Sung-Gap Leea,*
aDept. of Materials Engineering and Convergence Technology, RIGET, Gyeongsang National University, Jinju 52828, Korea
bBusiness Cooperation Center, Korea Institute of Ceramic Engineering and Technology, Jinju 52851, Korea
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K(Ta0.80Nb0.20)O3 films with Pb(Zr0.52Ti0.48)O3PZT buffer layer on Pt/Ti/SiO2/Si substrate were fabricated by sol-gel and spin-coating method. Structural and electrical properties were measured with variation of the sintering temperature, and the applicability to microwave materials was investigated. All K(Ta0.80Nb0.20)O3 films showed a cubic crystal structure. Average grain size was about 123~193 nm and average thickness of the K(Ta0.80Nb0.20)O3 films was approximately 366 nm. Through the AFM results, root mean square roughness (Rrms) of all K(Ta0.80Nb0.20)O3 films was around 6 nm. All K(Ta0.80Nb0.20)O3 films showed a tendency to increase dielectric loss as frequency increased. As the sintering temperature increased, tunability with an applied DC voltage indicated a decreasing tendency. Tunability and temperature coefficient of the K(Ta0.80Nb0.20)O3 film sintered at 700 oC showed good values of 22.1% at 10 V, -0.594/oC
Keywords: K(Ta0.80Nb0.20)O3, Microwave tunable devices, Buffer layer, Sol-gel, Spin coating
2022; 23(1): 29-32
Published on Feb 28, 2022
Dept. of Materials Engineering and Convergence Technology, RIGET, Gyeongsang National University, Jinju 52828, Korea
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