Articles
  • N2 plasma treatment of pigments with minute particle sizes to improve their dispersion properties in deionized water
  • Jingjing Zhanga, Yeong Min Parka, Xing Yan Tana, Mun Ki Baea, Dong Jun Kima, Tae Hwan Janga, Min Su Kima, Seung Whan Leeb and Tae Gyu Kimc,*

  • aDepartment of Nano Fusion Technology, Pusan National University, Busan, Korea
    bPlasma Technology Research Center, National Fusion Research Institute, 37 Dongjangsan-ro, Gunsan-si, Jeollabuk-do, 54004, Korea
    cDepartment of Nanomechatronics Engineering, Pusan National University, Busan, Korea

Abstract

Pigments with minute particle sizes, such as carbon black (CB) and pigment red 48:2 (P.R.48:2), are the most important types of pigment and have been widely used in many industrial applications. However, minute particles have large surface areas, high oil absorption and low surface energy. They therefore tend to be repellent to the vehicle and lose stability, resulting in significant increases in viscosity or reaggregation in the vehicle. Therefore, finding the best way to improve the dispersion properties of minute particle size pigments presents a major technical challenge. In this study, minute particle types of CB and P.R.48:2 were treated with nitrogen gas plasma generated via radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) to increase the dispersion properties of minute particles in deionized (DI) water. The morphologies and particle sizes of untreated and plasma treated particles were evaluated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The average distributions of particle size were measured using a laser particle sizer. Fourier transform infrared spectroscopy was carried out on the samples to identify changes in molecular interactions during plasma processing. The results of our analysis indicate that N2 plasma treatment is an effective method for improving the dispersibility of minute particles of pigment in DI water.


Keywords: N2 Plasma, Plasma treatment, Dispersion, Aggregation, RF-CVD

This Article

  • 2019; 20(6): 589-596

    Published on Dec 31, 2019

  • 10.36410/jcpr.2019.20.6.589
  • Received on Jun 13, 2019
  • Revised on Sep 5, 2019
  • Accepted on Sep 26, 2019

Correspondence to

  • Tae Gyu Kim
  • Department of Nanomechatronics Engineering, Pusan National University, Busan, Korea
    Tel : +82-55-350-5648 Fax: +82-55-350-6547

  • E-mail: tgkim@pusan.ac.kr