Articles
  • Structural and surface characteristics of TiO2 thin films grown by RF magnetron sputtering

  • Bong-Ju Leea, Youn-Saup Yoonb and Myung-Bok Leec,*

  • aDepartment of Physics, Chosun University, Gwangju 61452, Korea
    bDivision of Electrical and Electronic Engineering, Gwangju University, Gwangju 61743, Korea
    cDivision of Mechanical and Metallic Mold Engineering, Gwangju University, Gwangju 61743, Korea

Abstract

Titanium dioxide (TiO2) thin films were deposited on Si(100) substrates with RF magnetron sputtering, and variations of their structural and surface characteristics with sputtering process condition were investigated. TiO2 films were grown as a polycrystalline state with mixed phase of anatase and rutile at room temperature. The grain size and surface roughness decreased with increase of O2 gas molar ratio in ambient mixed gas of Ar and O2 during film deposition. XPS results showed the chemical state and stoichiometry did not strongly depend on Ar/O2 ratio in ambient gas. The water contact angle of the film surface became larger as the grain size and surface roughness of the film decreased. It is considered that hydrophilicity of the TiO2 film depend mainly on surface morphology and roughness rather than crystalline structure and chemical state of the film.


Keywords: TiO2 films, Sputtering, Surface morphology, Chemical state, Hydrophilicity

This Article

  • 2019; 20(4): 418-423

    Published on Aug 31, 2019

  • Received on Apr 17, 2019
  • Revised on Jul 10, 2019
  • Accepted on Aug 2, 2019

Correspondence to

  • Myung-Bok Lee

  • Division of Mechanical and Metallic Mold Engineering, Gwangju University, Gwangju 61743, Korea
    Tel : +82-62-670-2692
    Fax: +82-62-670-2698

  • E-mail: mblee3@gwangju.ac.kr