In this work, fluorine-doped tin dioxide ceramics were prepared by spark plasma sintering. In order to obtain a thin layer of fluorine-doped tin dioxide with high electrical conductivity and high optical transparency in the sputtering method, it is necessary to prepare a high density and high electrical conductivity target. To do so, tin dioxide powder and tin (II) fluoride powder were utilized to prepare the target. The concentration of fluorine was selected based on the mass ratio of tin (II) fluoride to tin dioxide and ranged between 0.04 and 0.24 (with 0.04 increments). After the powders were mixed, the target was made using spark plasma sintering. The best target had a mass ratio of tin (II) fluoride to tin dioxide of 0.16, with a relative density of 97% and an electrical resistance of 3 × 10−4 Ω.cm. This provided a suitable candidate for a target when using the sputtering method.

Keywords: Fluorine-doped tin dioxide, Spark plasma sintering, Sputtering, Electrical resistance, Transparency.