Articles
  • Enhanced nanodiamond nucleation by surface texturing of Si substrate in SF6/O2 plasmas 
  • Jong Cheon Parka, Ok Geun Jeonga, Sang Youn Kima, Tae Gyu Kimb, Jin Kon Kimb and Hyun Chob
  • a Department of Nano Fusion Technology, Pusan National University, Gyeongnam 627-706, Korea b Department of Nanomechatronics Engineering, Pusan National University, Gyeongnam 627-706, Korea
Abstract
SF6/O-2 plasma surface texturing was employed to pretreat Si substrate for achieving enhanced diamond nucleation density. Surface roughness of the textured Si was found to be strongly dependent on the process pressure and normalized roughness values in the range of 2-16 were obtained. Remarkably enhanced nucleation densities of similar to 10(10) cm(-2) compared to conventional mechanical abrasion were obtained after seeding for the surface textured Si substrates. Raman spectroscopy revealed that ultrananocrystalline diamond films with grain size below 10 nm were grown on the surface textured Si.

Keywords: Surface texturing; Si substrate; SF6/O-2 plasma; Nanodiamond nucleation; Nanocrystalline Diamond film; Nucleation density

This Article

  • 2014; 15(5): 336-340

    Published on Oct 31, 2014

Correspondence to

  • E-mail: